Reticle Exchanger, Reticle Cleaner

Used to remove and inspect attached defect when storing and using photo mask in the Fab
Plasma-based technology compared to conventional chemical cleaning (WET) technology, eco-friendly with no chemicals
Applying automatic feed stop to prevent the breakage of the photo mask by operator
Reduced cleaning time contributes to improved exposure equipment productivity
Reduce costs by eliminating chemicals and repairing without removing
Improved cleaning ability compared to WET equipment by applying plasma + N2 pressure cleaning function
Exchange function from Nikon Reticle Case to ASML (Nikon) Reticle Pod